An image of a mask containing the structure of an integrated ... a disk measuring 300 mm in diameter. Interestingly, DUV lithography at a wavelength of 193 nm has dominated the field much longer ...

Once the photoresist is applied, a mask with the desired pattern ... NIL is not limited by the diffraction or interference effects that limit the resolution of optical and electron-beam lithography.

Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photo resist layer. Overlay metrology ...

Conventional optical lithography is hindered by the diffraction limit ... nanostructures on the Au nanofilm without the need for a mask or vacuum atmosphere. Elemental analysis by energy ...

A research team led by Xuesong Mei and Jianlei Cui from Xi'an Jiaotong University has made significant progress in the field of nanotechnology. They have successfully achieved the direct writing of ...

His work includes development of mask-less lithography, microwave plasma chemical vapor deposition, and materials characterization techniques, including Raman spectroscopy, X-ray Diffraction, Scanning ...

However, it faces limitations such as diffraction and scattering of light, which set bounds on the minimum feature size that can be achieved. Advanced techniques like extreme ultraviolet (EUV) ...

A new study reveals a novel method for creating nanostructures on Au nano-films using a laser-irradiated scanning probe technique.

Nonetheless, EUV lithography is a next-generation technology ... of the absorber stack is required to obtain the best performance.” Researchers employed mask diffraction and imaging simulation to ...

Recently, a research team led by Xuesong Mei and Jianlei Cui from Xi’an Jiaotong University has made significant progress in ...