TSMC extends dominance of semiconductors with 56% share of global lithography systems
Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the ...
Why can’t light microscopes see inside cells?
Learn about the diffraction limit in microscopy and how super-resolution microscopy revolutionized the field, earning its ...
Digi Times10d
TSMC now reportedly operates over half of global EUVs, weighs high-NA adoption
Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the ...
EurekAlert!3d
Shape optimization for high efficiency metasurfaces: theory and implementation
Metasurfaces are formed by engineering a glass surface with an array of microscopic features, or meta-atoms. Although ...
Hosted on MSN16d
TSMC prioritizing high-NA EUV scanners for R&D
Taiwan Semiconductor Manufacturing Company is prioritizing, among its manufacturing tools, the acquisition of high numerical ...
Datacenter Dynamics22d
TSMC to receive first High NA EUV lithography machine from ASML in Q4
Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography machines from ASML before the end of the year. According to a ...